The Sasquatch Research Institute (printed, not embroidered logo) hat is made with 100% cotton twill for high-end comfort and durability, these custom distressed hats bring all the style and practicality one needs in daily life. The low profile along with the D-ring closure on a self-fabric hideaway strap ensures both proper protection from the sun and that perfect, adjustable fit. Please note: Small details and letters within 1/2 inch of the seam line should be avoided due to the nature of DTF printing. Small prints may lift from the fabric. Prefer wider logos and images, or ensure text has a sufficient background to improve adhesion. .: 100% cotton twill .: Sewn-in label .: Closure: self-fabric hideaway strap with metal D-ring slider .: Printed using Direct to Film (DTF) technology .: Please note: Due to a special finishing process, distress and color may vary